Contrast Boosted Resist Using Base-Labile Compound for Electron Beam Lithography

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Contrast Boosted Resist Using Base-Labile Compound for Electron Beam Lithography

Shou-ichi Uchino, Sonoko Migitaka, Jiro Yamamoto, Fumio Murai, Kyoko Kojima, Toshihiko Tanaka

Author information

Keywords: electron beam, contrast boosted resist, novolak

JOURNAL FREE ACCESS

1997 Volume 10 Issue 3 Pages 377-378

DOI https://doi.org/10.2494/photopolymer.10.377

Details

Article 1st page

Content from these authors

© The Technical Association of Photopolymers, Japan

Favorites & Alerts

Related articles

Recently viewed articles

Top