Photo Alignment Materials with High Sensitivity to Near UV Light

Yutaka Makita; Toru Natsui; Shin-ichi Kimura; Shoichi Nakata; Masayuki Kimura; Yasuo Matsuki; Yasumasa Takeuchi

doi:10.2494/photopolymer.11.187

Yutaka Makita, Toru Natsui, Shin-ichi Kimura, Shoichi Nakata, Masayuki Kimura, Yasuo Matsuki, Yasumasa Takeuchi

著者情報

キーワード: photo alignment, near UV, chalcone

ジャーナルフリー

1998 年 11 巻 2 号 p. 187-192

DOI https://doi.org/10.2494/photopolymer.11.187

詳細

抄録

We developed new photo alignment materials based on chalconyl structure with high sensitivity to near UV light. Poly(4-methacryloyloxy chalcone), PM4Ch, and its derivatives exhibited good LC alignment upon near UV exposure. The photoreactivity of chalconyl structure was high because due to longer wavelength of UV absorption. The high sensitivity of PM4Ch, compared with Poly(4′-methacryloyloxy chalcone), PMCh, could be explained by the suppression of isomerization and/or by the alignment capability of the side chain structure.

責任著者(Corresponding author)

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