Sulfonic Acid Ester Unit-containing Polymers for Surface Modification Resist

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Sulfonic Acid Ester Unit-containing Polymers for Surface Modification Resist

Masamitsu Shirai, Junji Nakanishi, Masahiro Tsunooka, Takahiro Matsuo, Masayuki Endo

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Keywords: photoresist, surface modification, dry development, sulfonic acid ester

JOURNAL FREE ACCESS

1998 Volume 11 Issue 4 Pages 641-644

DOI https://doi.org/10.2494/photopolymer.11.641

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© The Technical Association of Photopolymers, Japan

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