1999 Volume 12 Issue 1 Pages 39-44
Hexamethyldisilazane (HMDS) was subjected to plasma-assisted chemical vapor deposition (PCVD) for the formation of thin dielectric films on Al substrates for the use as a dielectric electrode in clinical bioelectric measurements. From the measurement of X-ray photoelectron spectroscopy, the PCVD film deposited at higher temperature was found to contain less amount of carbon and tend to approach silicon-nitride-like film. Dielectric loss, tanδ, of the PCVD films deposited on rough Al foil was too large, but it was small enough for the film on a smooth Al plate. The PCVD film deposited at 350°C on Al plate was found to have the greatest dielectric constant, εs, as well as the greatest mechanical strength and adhesivity. In the measurement of dielectric properties with a physiological salt solution on the PCVD film as an electrode, the PCVD films showed an excellent barrier property. A possibility for the application to clinical bioelectric measurements was suggested.
