Abstract
Calix[4]resocinarenes(C4-RAs), "C-tertaheptyl-calix[4]resorcinarene [C(7)C4-RA], C-tertaoctyl-calix[4]resorcinarene [C(8)C4-RA], C-tertanonyl-calix[4]resorcinarene [C(9)C4- RA], and C-tertaundecyl-calix[4]resorcinarene [C(11)C4-RA]", were synthesized by the acid-catalyzed condensation of resorcinol and alkylaldehyde. The obtained C4-RAs were well-dissolved in common organic solvents and their films were transparent above 300nm. Therefore, negative working photoresists based on C4-RAs, 4, 4′-methylenebis[2, 6-bis(hydroxymethyl)]phenol (MBHP) as a cross-linker, and a photo-acid generator diphenyliodonium 9, 10-dimethoxyanthracene-2-sulfonate (DIAS) has been developed. Particularly, the resist containing C(8)C4-RA had the dissolution property well-controlled by a conventional aqueous base developer [2.38wt% aqueous tetramethylammonium hydroxide(TMAH) solution]. Thus, the photoresist consisting of C(8)C4-RA (70wt%), MBHP (20wt%), and DIAS (10wt%) showed a sensitivity of 7mJ/cm-2 and a contrast of 6.1 when it was exposed to 365nm light and postbaked at 130°C for 3min, followed by developing with the TMAH developer at room temperature.
