Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Sub 100nm Pattern Fabrication Using Plasma Grafted Styrene Resist and E-Beam or Synchrotron Radiation Excited Etching
Mikinori Suzuki, Shinji Ogawa, Girish J. Phatak, Shinzo Morita
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Keywords: Sub 100nm Pattern Fabrication, Plasma Grafted Styrene Resist, E-Bea Excited Plasma, Synchrotron Radiation Excited Plasma, Plasma Etching
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1999 Volume 12 Issue 4 Pages 583-584

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