Abstract
The use of a variable duty cycle pulsed plasma, in lieu of the conventional continuous-wave operational mode, is employed to provide enhanced film chemistry control during polymer film formation. This film chemistry control is illustrated with studies of perfluorocarbon polymers and by synthesis of electrically conductive films from pyrrole. The ability to synthesize polymer films under very low power inputs, using the pulsed technique, permits generation of relatively linear polymeric structures. Contrasts in several important plasma variables under continuous and pulsed modes are identified and discussed in terms of their influence in providing added film chemistry control under pulsed conditions
