Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Reaction Mechanisms of Excimer Resists Studied by Laser Flash Photolysis
Shou TSUJI, Shu SEKI, Takahiro KOZAWA, Seiichi TAGAWA
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Keywords: chemically amplified resist, acid generator, onium salt, excimer laser, reaction mechanism, laser flash photolysis
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2000 Volume 13 Issue 5 Pages 729-732

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© The Technical Association of Photopolymers, Japan
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