Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Refractive Index Control with Using C-S-Au Compound by Plasma CVD and Sputtering
Masaki MatushitaMd. Abul KashemShinzo Morita
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2001 Volume 14 Issue 1 Pages 123-126

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Abstract
C-S and C-S-Au compound were formed by RF plasma CVD with using methane, SF6 and Ar mixture gas at a pressure of 0.1Torr, a discharge frequency of 13.56MHz and a discharge power of 100Watt, and a discharge duration of 30min, but C-S-Au compound was formed using gold plate set on the upper graphite discharge electrode instead of graphite plate. At the constant gas flow rate of 10 SCCM for methane and Ar, and the varying SF6 flow rate from 2 to 25 SCCM, the refractive indexes were changed from 1.7 to 2.4 and from 2.0 to 3.7 for C-S and C-S-Au compound, respectively.
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© The Technical Association of Photopolymers, Japan
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