Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Suppression of Pattern Edge Roughness by Low Ion Strength Developer
Teruhiko Kumada, Hiroaki Sumitani, Yasuji Matsui
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Keywords: SR lithography, resist, critical dimension, ion strength, developer
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2001 Volume 14 Issue 4 Pages 519-522

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© The Technical Association of Photopolymers, Japan
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