Improved Sensitivity of Multi-adduct Derivatives of Fullerene

Tetsuya Tada; Koichiro Uekusa; Toshihiko Kanayama; Takahiro Nakayama; Ross Chapman; Wai Yee Cheung; Louise Eden; Irfan Hussain; Mark Jennings; Jacob Perkins; Marcus Phillips; Jon A. Preece; Elwyn Shelley

doi:10.2494/photopolymer.14.543

Tetsuya Tada, Koichiro Uekusa, Toshihiko Kanayama, Takahiro Nakayama, Ross Chapman, Wai Yee Cheung, Louise Eden, Irfan Hussain, Mark Jennings, Jacob Perkins, Marcus Phillips, Jon A. Preece, Elwyn Shelley

Author information

Tetsuya Tada
Joint Research Center for Atom Technology (JRCAT), National Institute of Advanced Industrial Science and Technology (AIST)
Koichiro Uekusa
Joint Research Center for Atom Technology (JRCAT), National Institute of Advanced Industrial Science and Technology (AIST)
Toshihiko Kanayama
Joint Research Center for Atom Technology (JRCAT), National Institute of Advanced Industrial Science and Technology (AIST)
Takahiro Nakayama
Joint Research Center forAtom Technology (JRCAT), Angstrom Technology Partnership (ATP)
Ross Chapman
School of Chemistry, The University of Birmingham Edgbaston
Wai Yee Cheung
School of Chemistry, The University of Birmingham Edgbaston
Louise Eden
School of Chemistry, The University of Birmingham Edgbaston
Irfan Hussain
School of Chemistry, The University of Birmingham Edgbaston
Mark Jennings
School of Chemistry, The University of Birmingham Edgbaston
Jacob Perkins
School of Chemistry, The University of Birmingham Edgbaston
Marcus Phillips
School of Chemistry, The University of Birmingham Edgbaston
Jon A. Preece
School of Chemistry, The University of Birmingham Edgbaston
Elwyn Shelley
School of Chemistry, The University of Birmingham Edgbaston

Keywords: fullerene, methanofullerene, C₆₀, electron beam resist, nanolithography

JOURNAL FREE ACCESS

2001 Volume 14 Issue 4 Pages 543-546

DOI https://doi.org/10.2494/photopolymer.14.543

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Abstract

Methanofullerenes, a class of C₆₀ derivatives, act as negative type e-beam resists with 10-nm resolution and high dry-etch durability. Their sensitivity is -10^-3C/cm², one order of magnitude better than that of C₆₀. We studied sensitivities of methanofullerene resists by systematically changing side chains and have found that the methano bridge and >C=O in the side chains are important in the sensitivity improvement. We realized further sensitivity improvement by synthesizing methanofullerene with 4-6 side chains. This has about two orders of magnitude higher sensitivity (3.8×10^-4C/cm²) than that of C₆₀.

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