Materials and Resists for 193 and 157nm Applications

Abstract

Polymeric materials and resists for 193 and 157nm applications have shown good progress. Improvements and status in the area of methacrylate, cyclo-olefin/maleic anhydride (COMA), hybrid polymers and resists derived from these polymers are highlighted. While methacrylate polymers based on 2-methyl adamantyl methacrylate (MAdMA) continue to show excellent performance for contact and dense line and space applications, hybrid type polymers consisting of (among others) t-Butyl-5-norbonene-2-carboxylate (BNC), MAdMA and maleic anhydride exhibit the best performance for semi-dense and isolated line and space applications. Lithographic performance of representative formulations AZ® EXP AX™ 1020P, AZ® EXP AX™ 1040P, and AZ® EXP AX™ 2020P derived from each type of polymers are provided. A first 157nm resist system based on copolymers of norbornene-5-methylenehexafluoroisopropanol (NMHFA) and BNC, formulated with an additive obtained by copolymerization of t-butyl norbornene-5-trifluorom thyl-5-carboxylate (BNTC) with carbon monoxide demonstrating dense L/S resolution down to 90nm with >85° wall angle is also presented.