Recent Development in Photosensitive Polyimide (PSPI)

Abstract

Photosensitive polyimides (PSPIs) are attracting much attention as an insulating materials for microelectronic applications. PSPIs can be directly patterned, simplify processing steps and do not need a photoresist to be used in the micro-lithographic stage, nor a toxic etchant. This review introduces the recent development of PSPIs with emphasis placed on the chemistry responsible for images.