Synthesis and Lithographic Characterization of Poly(6-vinyluracil) Derivative

抄録

Enol ether derivative of poly(6-vinyluracil) was synthesized. The polymer released completely the tent-butyl groups above 190°C and gave poly(6-vinyluracil) which was stable up to 350°C. The resist film as spin coated from chloroform solution containing photo-acid generator released completely the tert-butyl groups after UV light irradiation followed by post exposure baking. Solubility of the obtained polymer containing uracil unit was significantly different from the original polymer containing alkoxy units in both polar (TMAH aq) and nonpolar (anisole) solvents as developer. The resist film was found to have high sensitivity and high contrast as both positive and negative type deep-UV resist materials.