I-Line Sensitive Photoacid and Photobase Generators and Their Use for Photocrosslinking System Based on Poly(vinylphenol) and Diepoxy Fluorene Derivatives

Abstract

I-Line sensitive photoacid and photobase generators were prepared. Their use for photocrosslinking of the blended system of poly(vinylphenol) (PVP) and diepoxy fluorene derivatives was studied. Photolysis properties of the photoacid and photobase generators were investigated and the effect of photo-sensitizer on photolysis of the photoacid or photobase generators was discussed. PVP films containing diepoxy fluorene derivatives, photoacid or photobase generators, and photo-sensitizers were photocrosslinkable on irradiation at 366nm after the post-exposure-bake (PEB) treatment. Photocrosslinking properties were discussed in terms of the irradiation dose, PEB temperature, structure of diepoxides, photoacid or photobase generators and photo-sensitizers. Thermal properties of the photocrosslinked PVP/diepoxy fluorene blends were investigated.