2002 Volume 15 Issue 5 Pages 715-730
Novel photosensitive polymers using photoacid and photobase generators are described. As photosensitive polymers using photoacid generators, two topics on i) copolymers of methacrylonitrile that are transparent at 157nm and promising as F2 resists and ii) photocrosslinkable polymers with thermally degradable units from the eviwpoint of recycling of photosensitive polymers are picked up. Subjects of photosensitive polymers using photobase genrators are i) photochemistry of oxime derivatives and onium salts and their use for design of novel photosensitive polymers and ii) polymeric photobase generators and their applications. The contents in this review include topics from basic concepts to up-to-date technology.
