Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Activation Energies for Deprotection Reaction of Chemically Amplified Resists: A Study Using In-situ FT-IR Spectroscopy
Toyofumi ShinozukaMasahiro TsunookaToshiro ItaniMasamitsu Shirai
Author information
JOURNAL FREE ACCESS

2002 Volume 15 Issue 5 Pages 765-768

Details
Article 1st page
Content from these authors
© The Technical Association of Photopolymers, Japan
Previous article Next article
feedback
Top