THE SYNTHESIS AND PHOTOSENSITIVITY OF ELEOSTEARIC ACID-RESORCIN SERIES PHENOLIC RESINS

抄録

A series of eleostearic acid-resorcin phenolic resins were synthesized, mainly including eleostearic acid-resorcin-formaldehyde resin (I)(softening point:70-75°C), methyl eleostearate-resorcin-formaldehyde resin(II)(softening point:65-70°C), N-hydroxyethyl eleostearic amide -resorcin-formaldehyde(III)(softening point:85-90°C). The relative molecular weights determined by GPC method are M_n:5.0×10³-1.0×10⁴, M_w:1.0 ×10⁴-4.0×10⁴, D:3.0-6.0. The reaction products were characterized using I.R. and elemental analysis. A detailed investigation was made on the photosensitivity of the photopolymers formed from these phenolic resins and BAC-M. All these negative photoresists can be developed in dilute aqueous base. The minimum quantities of exposure energy required are between 10-20mj/cm². Clear etched image with 3μm line width was obtained. The photocured films have excellent resistance to acids.