Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
ACID CATALYZED RESIST FOR KrF EXCIMER LASER LITHOGRAPHY
YASUNOBU ONISHI, HIROKAZU NIKI, YOSHIHITO KOBAYASHI, RUMIKO HORIGUCHI HAYASE, NAOHIKO OYASATO, OSAMU SASAKI
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1991 Volume 4 Issue 3 Pages 337-340

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© The Technical Association of Photopolymers, Japan
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