Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Application of chemically amplified positive resist PSR for advanced mask making
Kazuo Kazama, Fumio Murai, Toshihiko Khono, Toshio Sakamizu, Shinji Okazaki
Author information
JOURNAL FREE ACCESS

1993 Volume 6 Issue 1 Pages 49-52

Details
Download PDF (159K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Article 1st page
Content from these authors
© The Technical Association of Photopolymers, Japan
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top