Abstract
Bis(7-diethylaminocoumarin) ketone-3 (DEACK) can sensitize the homolysis of o-Chlorohexaarylbisimidazole (o-Cl-HABI). The radicals so generated can initiate the polymerization of methyl methacrylate (MMA) which was studied by dilatometry. The photopolymerization rate was determined to be proportional to the concentration with the exponent of 0.22, 0.80, 0.70 for DEACK, o-Cl-HABI, MMA, respectively. The system can be used as initiator of laser polymerization.