1996 Volume 9 Issue 2 Pages 277-284
In order to know the applicability of excimer laser ablation to the microphotoetching of collagen films, they were irradiated by an ArF (193nm) and a KrF (248nm) excimer laser through a mask. Well-defined patterning of excellent quality was attained only by the ArF laser, and its threshold fluence was 28mJ cm-2. Periodic microstructures were formed on the etched surfaces, and their size and shape were dependent on the laser fluence and the number of pulses. The mean roughness of the etched surfaces increased with the fluence and the number of pulses with convex relations. The summit to summit distance of the periodic structures increased linearly with the number of pulses.
