PHOTOSENSITIVE POLYIMIDES WITH 2-NITRO-p-XYLYLENE STRUCTURE

抄録

Several newly developed photosensitive polyimides derived from 2-nitro- p-xylyleneoxyamine a are described. These fully imidized photoresists exhibit both positive working image and high sensitivity upon light irradiation. The most efficient polyimide examined is one prepared using polyalicyclic unit as dianhydride, where the photosensitivity is ca. 80 mJ/cm². The conversion of polyamic acid to polyimide, the thermal stability and the solubility of these polyimides are investigated, and compared with those obtained from the polyimides prepared with p-xylyleneoxyamine b.