ACID LABILE CROSSLINKED UNITS: A NEW CONCEPT FOR DEEP-UV PHOTORESISTS
1996 年 9 巻 4 号 p. 573-586
詳細
1996 年 9 巻 4 号 p. 573-586
A new type of acetal protected hydroxystyrene polymers with acid labile crosslinked units has been developed for KrF excimer laser photoresists. Deep-UV photoresist formulations based on these new polymers provide better resolution and higher thermal flow stability than conventional systems. The polymer structure was evaluated by 13C-NMR spectroscopy and gel permeation chromatography. Factors controlling the crosslinking reactions and the impact of the crosslinking degree on lithographic properties are discussed.
