TRANSIENT SPECIES INDUCED IN X-RAY CHEMICALLY AMPLIFIED POSITIVE RESISTS

POST-EXPOSURE DELAY EFFECT

抄録

The post exposure delay (PED) effect on transient species induced in Xray chemically amplified positive resist was investigated. The resist consisted of m-cresol novolac (matrix polymer), bisphenol A protected with tert-butoxycarbonyl groups (dissolution inhibitor), and triphenylsulfonium triflate (acid generator). In order to analyze the PED effect, the changes in optical absorption were measured with a conventional spectrophotometer. For the resist system, it was observed that the absorbance of protonated intermediates of a matrix polymer decreased with PED time. The rate of decrease was accelerated by air borne contaminants, and was also affected by dissolution inhibitor.