Abstract
High flatness and smoothness is required to a rectangular glass mask. However, it is difficult to polish rectangular plates with a rotary polishing machine. The calculation program of polishing process for a rectangular plate has been developed and it was shown that the removal uniformity below ±5% is obtained by using the pincushion tool path. This paper describes fundamental data for the polishing simulation of quartz materials and the comparison of polishing profiles between the experiment and the simulation. It were clarified that the proportional region between relative speed and removal rate for quartz glass is three times larger than that for silicon polishing, and the simulation result for the rectangular plate does not coincide with the experimental one in the outside region where eccentric load becomes large.
