Development of ultra precision aspherical form measurement equipment for synchrotron radiation mirror

Abstract

A new ultra–precision profiler was developed to measure X–ray and EUV optics such as asymmetric and aspheric profiles. In the present study, using the high precision rotational movements, the normal vectors at each points on the surface are determined by the reflected light beam goes back exactly on the same path as the incident beam. Before now, the rotational angle error of the goniometers and the distortion of the holded mirror during measurement was serious issue. So, we developed a system for compensating the rotational angle error of the goniometers and simulate the change of mirror after holded. And we reported that the results which elliptical profile mirror for nanometer hard X–ray fousing were measured using the present instrument.