Abstract
Recent environmental consciousness has promoted that chemicals, which are typically used for semiconductor manufacturing, are replaced with some kinds of functional water. This paper describes the newly developed generation method of functional water by decomposing water molecules featuring jetting process of ultrapure water through minute holes in a nozzle. Electron spin resonance analyses have revealed that the water, which was jetted out through 833 holes with a diameter of 20μm at a pressure of 5 MPa, included OH radicals of 1.0μmol/L in it.
