Study on fine particle behavior in SiO<sub>2</sub> film CMP using evanescent field

Proceedings of JSPE Semestrial Meeting

2011 JSPE Autumn Conference

Session ID : F43

DOI https://doi.org/10.11522/pscjspe.2011A.0.165.0

Conference information

Host: The Japan Society for Precision Engineering

Study on fine particle behavior in SiO₂ film CMP using evanescent field

*Yoshikazu Idei, Keiichi Kimura, Keisuke Suzuki, Panart Khajornrungruang

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Keywords: Evanescent field, Fine particle, SiO2film-CMP, Material removal mechanism, Colloidal Silica, Ceria

CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract

[in Japanese]

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© 2011 The Japan Society for Precision Engineering

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