2011 JSPE Autumn Conference
Session ID : F67
Conference information
Host: The Japan Society for Precision Engineering
High-efficiency planarization of GaN wafers using photo-electro chemical reaction with applying bias
*Hiroya Asano, Shun Sadakuni, Yasuhisa Sano, Keita Yagi, Junji Murata, Takeshi Okamoto, Kazuma Tachibana, Kazuto Yamauchi
Author information
Keywords:
Ultraprecise Polishing,
Next-generation Semiconductor Substrate,
Planarization,
Electrochemistry,
New Processing Technology
Details
