Abstract
This study aimed to fabricate nanoscale structures on silicon substrates using nanoscratching and local anodic oxidation, which can be potentially used to make nano/micro molds for nanoimprint lithography. In this report, nanoscale concave and convex structures were fabricated by using aforementioned two methods, and those structures were etched by KOH solution in order to improve their depths/heights (or aspect ratios). As a result, the depths/heights were increased by more than ten times and the effectiveness of such hybrid fabrication methods was confirmed.