2011 JSPE Spring Conference
Session ID : G09
Conference information
Host: The Japan Society for Precision Engineering
Fabrication of damage-free curved silicon crystal substrate for a focusing X-ray spectrometer by Plasma Chemical Vaporization Machining (4th report)
Study on generation mechanism of surface roughness
*Mao Hosoda, Mikinori Nagano, Nobuyuki Zettsu, Kazuya Yamamura, Shoichi Shimada, Kazuo Taniguchi
Author information
Keywords:
Doubly curved crystal,
Johansson type,
Atmospheric pressure plasma,
Plasma Chemical Vaporization Machining,
X-ray fluorescence analysis,
Focusing
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