Abstract
The ion beam has been applied as a tool to fabricate micro-nano structures in lithography and sputtering process. The recent studies have shown that a swelling structure can be fabricated on a crystal surface by ion-beam irradiation with relatively low fluence caused by an irradiation-induced amorphousization. Increasing the fluence, the sputtering process becomes dominant and target atoms at the surface are removed to form a cave structure. In order to apply the swelling effect to fabrication process, it is required to confirm the controllability of the swelling height and to observe the transitional feature from the swelling to the cave structure. For that purpose, we have fabricated the swelling or cave structure on Si crystal by irradiating Ar ion. In this report, the relation between the height or depth of those structures and the fluence of Ar ion will be shown.
