Proceedings of JSPE Semestrial Meeting
2012 JSPE Spring Conference
Session ID : J39
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Host: The Japan Society for Precision Engineering

Polishing Characteristics of Functional and Difficult-to-machine Materials
*Shinji Koga, Toshiro Doi, Michio Uneda, Syuhei Kurokawa, Osamu Ohnishi, Keiji Matsuhiro
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Keywords: Lithium Niobate, CMP, Chemical Mechanical Polishing, Removal Rate
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[in Japanese]
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© 2012 The Japan Society for Precision Engineering
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