Proceedings of JSPE Semestrial Meeting
2013 JSPE Autumn Conference
Session ID : Q06
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Host: The Japan Society for Precision Engineering

[title in Japanese]
*Kousuke Shiozawa, Yasuhisa Sano, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Osamu Onishi, Mitio Uneta, Yu Okada, Kazuto Yamauchi
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Keywords: atmosphere pressure plasma, isotropic etching, affected layer
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[in Japanese]
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© 2013 The Japan Society for Precision Engineering
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