2013 JSPE Autumn Conference
Session ID : Q09
Conference information
Host: The Japan Society for Precision Engineering
Effect of the Polishing Equipment Behavior on Polishing Characteristics in CMP
Michio Uneda, *Yoshihiro Takahashi, Kazutaka Shibuya, Yoshio Nakamura, Daizo Ichikawa, Ken-ichi Ishikawa
Author information
Keywords:
Polishing,
Removal Rate,
Vibration Monitoring,
Frequency Analysis,
Coefficient of Friction,
Pad Surface Asperity
Details
