抄録
Knowledge of the forces distribution is essential to understand the material removal mechanism of MCF polishing process. The accumulated polishing forces are measured by moving the MCF slurry along its diameter direction with a certain step and the distributions of the pressure and shear force during MCF polishing are calculated. The closer to the center of MCF slurry, the larger the pressure is. The maximum shear force is generated at the position of about 5mm from the center of MCF slurry. The relationship between forces distribution and material removal is studied and a material removal model is proposed.
