Proceedings of JSPE Semestrial Meeting
2013 JSPE Spring Conference
Session ID : J16
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Host: The Japan Society for Precision Engineering

High efficiency CMP using a slurry-flow-back tool (2nd report)
Improvement of circular efficiency using a new groove pattern
*Yosuke Hirai, Kenichiro Yoshitomi, Masaaki Mochida
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Keywords: CMP, polishing pad, planarization, removal rate, slurry flow, efficiency polishing
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[in Japanese]
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© 2013 The Japan Society for Precision Engineering
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