2017 JSPE Autumn Conference
Session ID : A07
Conference information
Host: The Japan Society for Precision Engineering
Name : 2017 JSPE Autumn Conference
Location : [in Japanese]
Date : September 20, 2017 - September 22, 2017
Development of Supplying Device of Enhanced Slurry having Nano-Bubbles with Active Gas and Trial of High Removal Rate Chemical Mechanical Polishing of SiC Substrate
*Shinya Mizuuchi, Michio Uneda, Kazutaka Shibuya, Yoshio Nakamura, Daizo Ichikawa, Ken-ichi Ishikawa
Author information
Keywords:
Chemical Mechanical Polishing,
Removal Rate,
Enhanced Slurry,
Nano-bubbles,
Silicon Carbide
Details
