Abstract
In polishing of aspherical lens shape or a large diameter reflecting mirror such as astronomicalobservatory, 'a small tool' is used, which is smaller than the workpiece.Since small tools have low polishing efficiency, we propose a novel polishing method that leada to enhanced removal rate using AC electric field.In this paper, we describe the results for the basical polishing test for silicone wafer with the small tool using the slurry controlled by AC electric field.