Basic study of high efficiency polishing with a small tool using the slurry controlled by AC electric field -3rd report-

Abstract

In polishing of aspherical lens shape or a large diameter reflecting mirror such as astronomicalobservatory, 'a small tool' is used, which is smaller than the workpiece. Since small tools have low polishing efficiency, we propose a novel polishing method that leada to enhanced removal rate using AC electric field. In this paper, we describe the results of the frequency dependence of the polishing rate on silicon wafer by a small tool using slurry controlled by AC electric field. We will also describe the difference depending on the type of polishing pad.