Preparation of SUS304 stainless steel films using pulsed magnetron sputtering

Abstract

It has been reported that pulsed magnetron sputtering using an asymmetric pulse power source is a useful technique for depositing a dense thin film. In this study, the effect of the duty ratio of pulse frequency and applied frequency on the properties of SUS 304 stainless steel films was investigated. All films deposited at room temperature showed a metastable bcc structure regardless of frequency and duty ratio. On the other hand, it was found that the internal stress of the film depends on the pulse frequency, but it hardly depends on the duty ratio.