Research on polished particles of novel carbon allotropes using fullerenes (2nd report)

Abstract

For the purpose of high efficiency polishing of diamond substrates, which are hard and fragile materials, we have developed fullerene C₆₀ composite polishing fine particles. As a result of applying the developed fine particles to the polishing of the diamond substrate, it was confirmed that the material removal rate was improved and the surface roughness of the polished surface was reduced. In addition, a carbon allotrope different from fullerene C₆₀ was confirmed in the process of making fine particles. In this talk, we will report on the outline of the developed fine particles and the polishing results.