研究論文
反応性スパッタリング法により形成したAl-Cr-N系皮膜の特性におよぼすN2ガス分圧の影響
2004 年 55 巻 4 号 p. 271-275
詳細
2004 年 55 巻 4 号 p. 271-275
Al-Cr-N films were deposited using a DC reactive sputtering apparatus under different nitrogen partial pressures of 0 to 0.303Pa. The films deposited were characterized with respect to the crystalline structure, chemical composition, hardness and wear resistance. The results are summarized as follows:
1) N content in the film increased, and Al and Cr contents in the film inversely decreased with increasing nitrogen partial pressure. N content in the film was approximately 50at%, and Al and Cr contents were each approximately 25at% at a nitrogen partial pressure above 0.089Pa.
2) The x-ray intensity of B1(200) diffraction varied with the nitrogen partial pressure and attained a maximum at 0.177Pa.
3) The structure of the films was amorphous at 0.046Pa, and changed to B1 type at a nitrogen partial pressure above 0.046Pa.
4) The hardness of the films increased with increasing nitrogen partial pressure and attained a maximum at 0.177Pa.
5) The nitrogen partial pressure during deposition affected the friction coefficient and wear resistance of the deposited films.
