抄録
Transparent gas barrier silica films were synthesized on poly(ethylene terephthalate) substrates by a low-temperature plasma-enhanced chemical vapor deposition method using an organosilane/oxygen mixture. The gas barrier performances of the films were significantly affected by their structures and chemical compositions. Structural defects, such as grain boundaries, pinholes and cracks, degraded the gas barrier performance, as well as chemical-compositional defects, such as loosely packed siloxane-networks and imperfect siloxane-networks, due to the termination of networks with impurities. An excellent gas barrier performance was attained with a silica film consisting of densely-packed and fully cross-linked siloxane-networks.
