抄録
We prepared a self-assembled monolayer (SAM) from p-aminophenyltrimethoxysilane (APhS : NH2C6H10Si(OCH3)3) on Si substrate through chemical vapor deposition. The microstructured APhS-SAM/SiOx template onto Si substrate was fabricated by conventional vacuum ultraviolet lithography. Pd was selectively immobilized on regions of APhS-SAM as a catalyst for electroless Cu plating. The pH of the Pd solution was optimized by measuring the amount of deposited Pd obtained by X-ray photoelectron spectroscopy. At the pH values of 5 and 6, the amount of deposited Pd on the APhS-SAM increased. A Pd micropattern was prepared on the microstructured APhS-SAM from the solution. Cu was site-selectively deposited onto the microstructured Pd regions. The obtained Cu micropattern was transferred onto a Nafion® sheet by nanoimprint lithography. The shape of Cu micropattern on the sheets was observed to be the same as it is on the silicon substrate.
