表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
研究論文
二段階プラズマプロセスによる超はっ水高分子基板の作製
手嶋 勝弥高野 敦赤田 正典井上 泰志杉村 博之高井 治
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2005 年 56 巻 9 号 p. 524

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The wettability of a solid surface is governed by two factors, that is, its surface morphology and composition. Ultra water-repellent polymeric substrates [poly(ethylene naphthalate) and polystyrene] have been fabricated while retaining their transparency by a two-step plasma process combining oxygen plasma etching and plasma-enhanced chemical vapor deposition (PECVD). In order to avoid optical scattering, appropriate nanotextures were prepared on the polymeric substrates through the oxygen plasma etching. Subsequently, a hydrophobic layer was coated on the nanotextured surfaces by PECVD using an organosilane source. The modified surfaces were certainly ultra-water-repellent, showing water contact angles greater than 150°.

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© 2005 一般社団法人 表面技術協会
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