表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
研究論文
フォトリソグラフィとアノード酸化を利用したAl薄膜の表面加工
勝又 信行石田 正文斎藤 修
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2008 年 59 巻 5 号 p. 333

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This paper addresses a new method of surface patterning for thin aluminum films using photolithography, anodization, and chemical etching. Aluminum film with a thickness of about 150nm was deposited on titanium-coated silicon or slide glass substrates. Subsequently, square masks were patterned on the aluminum film using photolithography. While aluminum film was anodized in 1vol% sulfuric acid, an anodic oxide film formed in the photoresist/aluminum film interface in addition to on open surface regions. In this process, the thickness of the anodic oxide film formed under the photoresist was affected by the bath voltage and the thickness of the titanium layer. Since the thickness of the anodic oxide at open surface regions and at masked regions differed, a patterned surface was developed. In order to examine the surface morphology, the anodic oxide film was removed by chemical etching in 21vol% phosphoric acid. As result, the anodic oxide film was removed, leaving an aluminum film of convex shape on the substrate.

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© 2008 一般社団法人 表面技術協会
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