抄録
This paper addresses the formation of the nickel mask on glass using electroless nickel plating without a pinhole. The resultant fine-patterned mask formed on the glass using electroless Ni plating with precision filtration is almost pore-free. The optical density of the glass was greater than 4.0 because of the nickel deposits, with thickness greater than 0.15 μm. The adhesion strength between the deposited Ni and glass is slightly lower than that of the sputtered Cr. The adhesion strength is, however, increased and reaches an almost identical value after heat treatment at 350°C for 1 hr. Fine circuit patterns without a pinhole were formed by the etchant, a HNO3 and H3PO4 mixture. Furthermore, the conventional repair method for the chromium mask pattern is applicable for the repair of nickel patterns on glass.
