抄録
Susceptibility to the bipolar phenomena in electroplating has been investigated for various-plating baths. It was found that these phenomena take place more easily in the baths of lower conductivity and lower polarization. Oxide films produced by the bipolar phenomena caused a significant influence on the subsequent plating process. In the chromium plating on the passivated bright nickel plates, from a bath containing sulfuric acid, hydrated chromium oxide showing interference color or milk-white chromium metal was deposited, while bright but slightly dull chromium deposits were obtained from a bath containing sodium silicofluoride. It has been assumed that the differences in the surface states of the metal deposits from the two different baths are due to the effect of additives in the deposition process but not in the anodizing process.
